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研究成果 2000 2018

  • 1134 引用
  • 15 h指数
  • 84 記事
  • 28 会議での発言
  • 15 Conference article
フィルター
会議での発言
2018

Cross-correlation analysis of fluctuations of interactions between nanoparticles and low pressure reactive plasmas

Zhou, R., Mori, K., Ohtomo, H., Yamashita, D., Seo, H., Itagaki, N., Koga, K. & Shiratan, M., 1 1 2018, THERMEC 2018. Chandra, T., Ionescu, M., Shabadi, R., Richard, C. & Jeandin, M. (版). Trans Tech Publications Ltd, p. 2104-2108 5 p. (Materials Science Forum; 巻数 941 MSF).

研究成果: 著書/レポートタイプへの貢献会議での発言

Beam plasma interactions
cross correlation
low pressure
Nanoparticles
Plasmas

Effects of sputtering pressure on (Zno)x(inn)1-x crystal film growth at 450ºc

Itagaki, N., Takeuchi, K., Miyahara, N., Imoto, K., Seo, H., Koga, K. & Shiratani, M., 1 1 2018, THERMEC 2018. Shabadi, R., Chandra, T., Ionescu, M., Jeandin, M. & Richard, C. (版). Trans Tech Publications Ltd, p. 2093-2098 6 p. (Materials Science Forum; 巻数 941 MSF).

研究成果: 著書/レポートタイプへの貢献会議での発言

Film growth
Crystal growth
Sputtering
sputtering
crystals

Photoluminescence of (Zno)0.82(inn)0.18 films: Incident light angle dependence

Miyahara, N., Iwasaki, K., Yamashita, D., Nakamura, D., Seo, H., Koga, K., Shiratani, M. & Itagaki, N., 1 1 2018, THERMEC 2018. Jeandin, M., Shabadi, R., Ionescu, M., Chandra, T. & Richard, C. (版). Trans Tech Publications Ltd, p. 2099-2103 5 p. (Materials Science Forum; 巻数 941 MSF).

研究成果: 著書/レポートタイプへの貢献会議での発言

Photoluminescence
photoluminescence
wurtzite
Energy gap
Crystals
2017
2 引用 (Scopus)

Fluctuation of position and energy of a fine particle in plasma nanofabrication

Shiratani, M., Soejima, M., Seo, H., Itagaki, N. & Koga, K., 1 1 2017, THERMEC 2016. Ionescu, M., Mishra, B., Kozeschnik, E., Sommitsch, C., Chandra, T. & Mishra, B. (版). Trans Tech Publications Ltd, p. 1772-1777 6 p. (Materials Science Forum; 巻数 879).

研究成果: 著書/レポートタイプへの貢献会議での発言

nanofabrication
Nanotechnology
Electrostatic force
Plasmas
Optical tweezers

Synthesis of nanoparticles using low temperature plasmas and its application to solar cells and tracers in living body

Koga, K., Seo, H., Tanaka, A., Itagaki, N. & Shiratani, M., 1 1 2017, Plasma Nano Science and Technology. Cvelbar, U. & Mascher, P. (版). 3 版 Electrochemical Society Inc., 巻 77. p. 17-24 8 p.

研究成果: 著書/レポートタイプへの貢献会議での発言

Solar cells
Nanoparticles
Plasmas
Temperature
Biotechnology
2016
2 引用 (Scopus)

Relationship between electric properties and surface flatness of (ZnO)x(InN)1-x films on ZnO templates

Matsushima, K., Shiratani, M. & Itagaki, N., 11 21 2016, 16th International Conference on Nanotechnology - IEEE NANO 2016. Institute of Electrical and Electronics Engineers Inc., p. 674-675 2 p. 7751421. (16th International Conference on Nanotechnology - IEEE NANO 2016).

研究成果: 著書/レポートタイプへの貢献会議での発言

flatness
Electric properties
templates
electrical properties
Electron mobility
2015

ZnO-based semiconductors with tunable band gap for solar sell applications

Itagaki, N., Matsushima, K., Yamashita, D., Seo, H., Koga, K. & Shiratani, M., 1 1 2015, Oxide-Based Materials and Devices VI. Teherani, F. H., Look, D. C. & Rogers, D. J. (版). SPIE, 巻 9364. 93640P

研究成果: 著書/レポートタイプへの貢献会議での発言

Carrier lifetime
Band Gap
Semiconductors
Energy gap
Semiconductor materials
2014
2 引用 (Scopus)

Nanostructure control of Si and Ge quantum dots based solar cells using plasma processes

Shiratani, M., Uchida, G., Seo, H. W., Ichida, D., Koga, K., Itagaki, N. & Kamataki, K., 2014, THERMEC 2013. Trans Tech Publications Ltd, 巻 783-786. p. 2022-2027 6 p. (Materials Science Forum; 巻数 783-786).

研究成果: 著書/レポートタイプへの貢献会議での発言

Semiconductor quantum dots
Nanostructures
Solar cells
solar cells
quantum dots
1 引用 (Scopus)

Off-axis sputter deposition of ZnO films on c-sapphire substrates with buffer layers prepared via nitrogen-mediated crystallization

Itagaki, N., Matsushima, K., Yamashita, D., Seo, H., Koga, K. & Shiratani, M., 1 1 2014, Oxide-Based Materials and Devices V. SPIE, 89871A. (Proceedings of SPIE - The International Society for Optical Engineering; 巻数 8987).

研究成果: 著書/レポートタイプへの貢献会議での発言

Sputter deposition
Aluminum Oxide
Sapphire
Buffer layers
Crystallization
2013
2 引用 (Scopus)

Model for thickness dependence of mobility and concentration in highly conductive ZnO

Look, D. C., Leedy, K. D., Kiefer, A., Claflin, B., Itagaki, N., Matsushima, K. & Surhariadi, I., 5 30 2013, Oxide-Based Materials and Devices IV. 巻 8626. 862602

研究成果: 著書/レポートタイプへの貢献会議での発言

Quartz
Electron scattering
Reflectometers
Buffer layers
Carrier concentration
2012

Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition

Shiratani, M., Hatozaki, K., Hashimoto, Y., Kim, Y., Seo, H., Kamataki, K., Uchida, G., Itagaki, N. & Koga, K., 11 28 2012, Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2012. p. 377-382 6 p. (Materials Research Society Symposium Proceedings; 巻数 1426).

研究成果: 著書/レポートタイプへの貢献会議での発言

filters
soaking
cells
Amorphous silicon
amorphous silicon
8 引用 (Scopus)

In-situ measurements of cluster volume fraction in silicon thin films using quartz crystal microbalances

Kim, Y., Hatozaki, K., Hashimoto, Y., Seo, H., Uchida, G., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 11 28 2012, Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2012. p. 307-311 5 p. (Materials Research Society Symposium Proceedings; 巻数 1426).

研究成果: 著書/レポートタイプへの貢献会議での発言

Quartz crystal microbalances
Silicon
in situ measurement
quartz crystals
microbalances

Investigations on the energy balance of the substrate during ZnO magnetron sputtering

Bornholdt, S., Kuwahara, K., Itagaki, N., Wulff, H., Shiratani, M. & Kersten, H., 12 1 2012, 39th EPS Conference on Plasma Physics 2012, EPS 2012 and the 16th International Congress on Plasma Physics. p. 1038-1041 4 p. (39th EPS Conference on Plasma Physics 2012, EPS 2012 and the 16th International Congress on Plasma Physics; 巻数 2).

研究成果: 著書/レポートタイプへの貢献会議での発言

14 引用 (Scopus)

Novel fabrication method for ZnO films via nitrogen-mediated crystallization

Itagaki, N., Kuwahara, K., Matsushima, K. & Oshikawa, K., 3 23 2012, Oxide-Based Materials and Devices III. 826306. (Proceedings of SPIE - The International Society for Optical Engineering; 巻数 8263).

研究成果: 著書/レポートタイプへの貢献会議での発言

Crystallization
Nitrogen
Fabrication
crystallization
nitrogen
6 引用 (Scopus)

Novel fabrication method of ZnO films utilizing solid-phase crystallized seed layers

Itagaki, N. & Kuwahara, K., 1 1 2012, Transparent Conducting Oxides and Applications. p. 15-20 6 p. (Materials Research Society Symposium Proceedings; 巻数 1315).

研究成果: 著書/レポートタイプへの貢献会議での発言

Seed
solid phases
seeds
Fabrication
fabrication
2 引用 (Scopus)

The optical analysis and application of size-controllable Si quantum dots fabricated by multi-hollow discharge plasma chemical vapor deposition

Seo, H., Wang, Y., Uchida, G., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 11 28 2012, Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2012. p. 313-318 6 p. (Materials Research Society Symposium Proceedings; 巻数 1426).

研究成果: 著書/レポートタイプへの貢献会議での発言

plasma jets
Semiconductor quantum dots
Chemical vapor deposition
hollow
Solar cells
2011

Generation and surface modification of Si nano-particles using SiH 4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics

Koga, K., Uchida, G., Yamamoto, K., Sato, M., Kawashima, Y., Kamataki, K., Itagaki, N. & Shiratani, M., 12 29 2011, International Conference on Advances in Condensed and Nano Materials, ICACNM-2011. p. 27-30 4 p. (AIP Conference Proceedings; 巻数 1393).

研究成果: 著書/レポートタイプへの貢献会議での発言

hollow
silicon
plasma jets
excitons
composite materials

Novel fabrication method for transparent conducting oxide films utilizing solid-phase crystallized seed layers

Itagaki, N., Kuwahara, K. & Nakahara, K., 12 29 2011, International Conference on Advances in Condensed and Nano Materials, ICACNM-2011. p. 23-26 4 p. (AIP Conference Proceedings; 巻数 1393).

研究成果: 著書/レポートタイプへの貢献会議での発言

oxide films
solid phases
seeds
conduction
fabrication
2010

Cluster-free B-doped a-Si:H films deposited using SiH4 + B 10H14 multi-hollow discharges

Nakahara, K., Kawashima, Y., Sato, M., Matsunaga, T., Yamamoto, K., Nakamura, W. M., Yamashita, D., Matsuzaki, H., Uchida, G., Itagaki, N., Koga, K. & Shiratani, M., 12 1 2010, TENCON 2010 - 2010 IEEE Region 10 Conference. p. 2216-2218 3 p. 5686686

研究成果: 著書/レポートタイプへの貢献会議での発言

Deposition rates
Plasma CVD
Optical band gaps
Surface reactions
Flow of gases
1 引用 (Scopus)

Deposition of cluster-free P-doped A-Si:H films using a multi-hollow discharge plasma CVD method

Nakahara, K., Kawashima, Y., Sato, M., Matsunaga, T., Yamamoto, K., Nakamura, W. M., Yamashita, D., Matsuzaki, H., Uchida, G., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 12 20 2010, Program - 35th IEEE Photovoltaic Specialists Conference, PVSC 2010. p. 3722-3725 4 p. 5616514. (Conference Record of the IEEE Photovoltaic Specialists Conference).

研究成果: 著書/レポートタイプへの貢献会議での発言

Plasma CVD
Deposition rates
Flow of gases
Flow rate
Defect density

Deposition profiles of microcrystalline silicon films using multi-hollow discharge plasma CVD

Matsunaga, T., Kawashima, Y., Koga, K., Nakahara, K., Nakamura, W. M., Uchida, G., Itagaki, N., Yamashita, D., Matsuzaki, H. & Shiratani, M., 12 1 2010, TENCON 2010 - 2010 IEEE Region 10 Conference. p. 2219-2221 3 p. 5686679. (IEEE Region 10 Annual International Conference, Proceedings/TENCON).

研究成果: 著書/レポートタイプへの貢献会議での発言

Plasma CVD
Microcrystalline silicon
Crystalline materials
Silicon
Substrates
1 引用 (Scopus)

Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas

Kamataki, K., Miyata, H., Koga, K., Uchida, G., Itagaki, N., Yamashita, D., Matsuzaki, H. & Shiratani, M., 2010, TENCON 2010 - 2010 IEEE Region 10 Conference. p. 1943-1947 5 p. 5686456

研究成果: 著書/レポートタイプへの貢献会議での発言

Amplitude modulation
Plasmas
Electric potential
Plasma CVD

Effects of Ar addition on breakdown voltage in a Si(CH3) 2(OCH3)2 RF discharge

Uchida, G., Nunomutra, S., Miyata, H., Iwashita, S., Yamashita, D., Matsuzaki, H., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 12 1 2010, TENCON 2010 - 2010 IEEE Region 10 Conference. p. 2199-2201 3 p. 5686704. (IEEE Region 10 Annual International Conference, Proceedings/TENCON).

研究成果: 著書/レポートタイプへの貢献会議での発言

Electric breakdown
Electron emission
Ions
Discharge (fluid mechanics)
Cathodes
1 引用 (Scopus)

Keynote speech I: Fluctuation control for plasma nanotechnologies

Shiratani, M., Koga, K., Uchida, G., Itagaki, N. & Kamataki, K., 12 1 2010, TENCON 2010 - 2010 IEEE Region 10 Conference. 5685920. (IEEE Region 10 Annual International Conference, Proceedings/TENCON).

研究成果: 著書/レポートタイプへの貢献会議での発言

Nanotechnology
Nanostructured materials
Plasmas
Fabrication
Nanostructures
5 引用 (Scopus)

Novel fabrication method for oxide semiconductors via atomic-additive mediated crystallization

Itagaki, N., 12 1 2010, TENCON 2010 - 2010 IEEE Region 10 Conference. p. 998-1001 4 p. 5686461. (IEEE Region 10 Annual International Conference, Proceedings/TENCON).

研究成果: 著書/レポートタイプへの貢献会議での発言

Crystallization
Amorphous films
Fabrication
Oxide films
Sputtering
2 引用 (Scopus)

Si quantum dot-sensitized solar cells using Si nanoparticles produced by plasma CVD

Kawashima, Y., Yamamoto, K., Sato, M., Nakahara, K., Matsunaga, T., Nakamura, W. M., Yamashita, D., Matsuzaki, H., Uchida, G., Kamataki, K., Itagaki, N., Koga, K., Shiratani, M. & Kondo, M., 12 20 2010, Program - 35th IEEE Photovoltaic Specialists Conference, PVSC 2010. p. 3347-3351 5 p. 5617205. (Conference Record of the IEEE Photovoltaic Specialists Conference).

研究成果: 著書/レポートタイプへの貢献会議での発言

Plasma CVD
Semiconductor quantum dots
Solar cells
Nanoparticles
Current density
2009
3 引用 (Scopus)

Favorable elements for an indium-based amorphous oxide TFT channel: Study of In-X-O (X=B, Mg, Al, Si, Ti, Zn, Ga, Ge, Mo, Sn) systems

Goyal, A., Iwasaki, T., Itagaki, N., Den, T. & Kumomi, H., 2009, Transparent Conductors and Semiconductors for Optoelectronics. 巻 1109. p. 43-48 6 p.

研究成果: 著書/レポートタイプへの貢献会議での発言

Indium
Thin film transistors
Oxide films
indium
transistors
2006
9 引用 (Scopus)

Combinatorial study on In-Ga-Zn-O semiconductor films as active-channel layers for thin-film transistor

Iwasaki, T., Itagaki, N., Den, T., Kumomi, H., Nomura, K., Kamiya, T. & Hosono, H., 12 1 2006, Current and Future Trends of Functional Oxide Films. p. 80-85 6 p. (Materials Research Society Symposium Proceedings; 巻数 928).

研究成果: 著書/レポートタイプへの貢献会議での発言

Thin film transistors
Semiconductor materials
Oxygen
Argon
Chemical analysis