3D Global Heat Transfer Model on Floating Zone for Silicon Single Crystal Growth

Xue Feng Han, Xin Liu, Satoshi Nakano, Hirofumi Harada, Yoshiji Miyamura, Koichi Kakimoto

研究成果: Contribution to journalArticle

2 引用 (Scopus)

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In this paper, a three-dimensional global heat transfer model to describe the floating zone of silicon single-crystal growth is proposed. The steady-state calculations considering argon gas flow, feed rod, silicon melt and crystal are carried out using open source software OpenFOAM with no assumptions of symmetry. From the global calculation, a three dimensional solid-liquid interface has been obtained. Furthermore, the cooling effect of gas flow in three dimensions is considered, and the three-dimensional current-density distribution of the inductor is calculated. By considering the asymmetrical electromagnetic field induced by the inductor, the calculations reveal a deflection of the asymmetrical solid-liquid interface.

元の言語英語
記事番号1700246
ジャーナルCrystal Research and Technology
53
発行部数5
DOI
出版物ステータス出版済み - 5 1 2018

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

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