3D Global Heat Transfer Model on Floating Zone for Silicon Single Crystal Growth

Xue Feng Han, Xin Liu, Satoshi Nakano, Hirofumi Harada, Yoshiji Miyamura, Koichi Kakimoto

研究成果: ジャーナルへの寄稿学術誌査読

2 被引用数 (Scopus)

抄録

In this paper, a three-dimensional global heat transfer model to describe the floating zone of silicon single-crystal growth is proposed. The steady-state calculations considering argon gas flow, feed rod, silicon melt and crystal are carried out using open source software OpenFOAM with no assumptions of symmetry. From the global calculation, a three dimensional solid-liquid interface has been obtained. Furthermore, the cooling effect of gas flow in three dimensions is considered, and the three-dimensional current-density distribution of the inductor is calculated. By considering the asymmetrical electromagnetic field induced by the inductor, the calculations reveal a deflection of the asymmetrical solid-liquid interface.

本文言語英語
論文番号1700246
ジャーナルCrystal Research and Technology
53
5
DOI
出版ステータス出版済み - 5月 1 2018

All Science Journal Classification (ASJC) codes

  • 化学 (全般)
  • 材料科学(全般)
  • 凝縮系物理学

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