8“ uniform electron cyclotron resonance plasma source using a circular TE01 mode microwave

Ryota Hidaka, Toru Yamaguchi, Nobuyoshi Hirotsu, Takaharu Ohshima, Ryuji Koga, Masayoshi Tanaka, Yoshinobu Kawai

    研究成果: ジャーナルへの寄稿記事

    27 引用 (Scopus)

    抄録

    A new type of electron cyclotron resonance (ECR) plasma source has been developed using a circular TE01 mode microwave converted from the principal TE10 rectangular mode. The ion saturation current density of 36 mA/cm2 is achieved for the input microwave power of 3 kW at the nitrogen gas pressure of 5 x 10-4 Torr. The uniformity of the ion saturation current density is within ±3% over 8 inches in diameter, which is better than that produced by a conventional TE11 mode microwave. The mean ion energy at the substrate position in this ECR plasma source is in the range of 20-30 eV, depending on the shape of magnetic fields. The direction of ion motion is confirmed by etching test to be almost perpendicular to the wafer and to be useful for fabricating ULSI circuits on wafers larger than 6 inches in diameter.

    元の言語英語
    ページ(範囲)174-178
    ページ数5
    ジャーナルJapanese Journal of Applied Physics
    32
    発行部数1 R
    DOI
    出版物ステータス出版済み - 1 1993

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    Electron cyclotron resonance
    Plasma sources
    electron cyclotron resonance
    Microwaves
    microwaves
    Ions
    wafers
    current density
    saturation
    ion motion
    ions
    Current density
    ULSI circuits
    gas pressure
    etching
    nitrogen
    Etching
    Magnetic fields
    Nitrogen
    magnetic fields

    All Science Journal Classification (ASJC) codes

    • Engineering(all)
    • Physics and Astronomy(all)

    これを引用

    Hidaka, R., Yamaguchi, T., Hirotsu, N., Ohshima, T., Koga, R., Tanaka, M., & Kawai, Y. (1993). 8“ uniform electron cyclotron resonance plasma source using a circular TE01 mode microwave. Japanese Journal of Applied Physics, 32(1 R), 174-178. https://doi.org/10.1143/JJAP.32.174

    8“ uniform electron cyclotron resonance plasma source using a circular TE01 mode microwave. / Hidaka, Ryota; Yamaguchi, Toru; Hirotsu, Nobuyoshi; Ohshima, Takaharu; Koga, Ryuji; Tanaka, Masayoshi; Kawai, Yoshinobu.

    :: Japanese Journal of Applied Physics, 巻 32, 番号 1 R, 01.1993, p. 174-178.

    研究成果: ジャーナルへの寄稿記事

    Hidaka, R, Yamaguchi, T, Hirotsu, N, Ohshima, T, Koga, R, Tanaka, M & Kawai, Y 1993, '8“ uniform electron cyclotron resonance plasma source using a circular TE01 mode microwave', Japanese Journal of Applied Physics, 巻. 32, 番号 1 R, pp. 174-178. https://doi.org/10.1143/JJAP.32.174
    Hidaka, Ryota ; Yamaguchi, Toru ; Hirotsu, Nobuyoshi ; Ohshima, Takaharu ; Koga, Ryuji ; Tanaka, Masayoshi ; Kawai, Yoshinobu. / 8“ uniform electron cyclotron resonance plasma source using a circular TE01 mode microwave. :: Japanese Journal of Applied Physics. 1993 ; 巻 32, 番号 1 R. pp. 174-178.
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    abstract = "A new type of electron cyclotron resonance (ECR) plasma source has been developed using a circular TE01 mode microwave converted from the principal TE10 rectangular mode. The ion saturation current density of 36 mA/cm2 is achieved for the input microwave power of 3 kW at the nitrogen gas pressure of 5 x 10-4 Torr. The uniformity of the ion saturation current density is within ±3{\%} over 8 inches in diameter, which is better than that produced by a conventional TE11 mode microwave. The mean ion energy at the substrate position in this ECR plasma source is in the range of 20-30 eV, depending on the shape of magnetic fields. The direction of ion motion is confirmed by etching test to be almost perpendicular to the wafer and to be useful for fabricating ULSI circuits on wafers larger than 6 inches in diameter.",
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