8“ uniform electron cyclotron resonance plasma source using a circular TE01 mode microwave

Ryota Hidaka, Toru Yamaguchi, Nobuyoshi Hirotsu, Takaharu Ohshima, Ryuji Koga, Masayoshi Tanaka, Yoshinobu Kawai

    研究成果: Contribution to journalArticle査読

    27 被引用数 (Scopus)

    抄録

    A new type of electron cyclotron resonance (ECR) plasma source has been developed using a circular TE01 mode microwave converted from the principal TE10 rectangular mode. The ion saturation current density of 36 mA/cm2 is achieved for the input microwave power of 3 kW at the nitrogen gas pressure of 5 x 10-4 Torr. The uniformity of the ion saturation current density is within ±3% over 8 inches in diameter, which is better than that produced by a conventional TE11 mode microwave. The mean ion energy at the substrate position in this ECR plasma source is in the range of 20-30 eV, depending on the shape of magnetic fields. The direction of ion motion is confirmed by etching test to be almost perpendicular to the wafer and to be useful for fabricating ULSI circuits on wafers larger than 6 inches in diameter.

    本文言語英語
    ページ(範囲)174-178
    ページ数5
    ジャーナルJapanese journal of applied physics
    32
    1 R
    DOI
    出版ステータス出版済み - 1 1993

    All Science Journal Classification (ASJC) codes

    • Engineering(all)
    • Physics and Astronomy(all)

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