8“ uniform electron cyclotron resonance plasma source using a circular TE01 mode microwave

Ryota Hidaka, Toru Yamaguchi, Nobuyoshi Hirotsu, Takaharu Ohshima, Ryuji Koga, Masayoshi Tanaka, Yoshinobu Kawai

研究成果: Contribution to journalArticle査読

28 被引用数 (Scopus)

抄録

A new type of electron cyclotron resonance (ECR) plasma source has been developed using a circular TE01 mode microwave converted from the principal TE10 rectangular mode. The ion saturation current density of 36 mA/cm2 is achieved for the input microwave power of 3 kW at the nitrogen gas pressure of 5 x 10-4 Torr. The uniformity of the ion saturation current density is within ±3% over 8 inches in diameter, which is better than that produced by a conventional TE11 mode microwave. The mean ion energy at the substrate position in this ECR plasma source is in the range of 20-30 eV, depending on the shape of magnetic fields. The direction of ion motion is confirmed by etching test to be almost perpendicular to the wafer and to be useful for fabricating ULSI circuits on wafers larger than 6 inches in diameter.

本文言語英語
ページ(範囲)174-178
ページ数5
ジャーナルJapanese journal of applied physics
32
1 R
DOI
出版ステータス出版済み - 1 1993
外部発表はい

All Science Journal Classification (ASJC) codes

  • 工学(全般)
  • 物理学および天文学(全般)

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