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出版年

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  • 2011

著者

  • Masaharu Shiratani
2012

The blocking effect of charge recombination by sputtered and acid-treated ZnO thin film in dye-sensitized solar cells

Seo, H., Son, M. K., Park, S., Kim, H. J. & Shiratani, M., 11 15 2012, : : Journal of Photochemistry and Photobiology A: Chemistry. 248, p. 50-54 5 p.

研究成果: Contribution to journalArticle

16 引用 (Scopus)

The optical analysis and application of size-controllable Si quantum dots fabricated by multi-hollow discharge plasma chemical vapor deposition

Seo, H., Wang, Y., Uchida, G., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 11 28 2012, Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2012. p. 313-318 6 p. (Materials Research Society Symposium Proceedings; 巻数 1426).

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

2 引用 (Scopus)
2011

Combinatorial analyses of plasma-polymer interactions

Setsuhara, Y., Cho, K., Takenaka, K., Shiratani, M., Sekine, M. & Hori, M., 7 25 2011, : : Surface and Coatings Technology. 205, SUPPL. 2

研究成果: Contribution to journalArticle

8 引用 (Scopus)

Comparison between silicon thin films with and without incorporating crystalline silicon nanoparticles into the film

Koga, K., Matsunaga, T., Nakamura, W. M., Nakahara, K., Kawashima, Y., Uchida, G., Kamataki, K., Itagaki, N. & Shiratani, M., 8 1 2011, : : Thin Solid Films. 519, 20, p. 6896-6898 3 p.

研究成果: Contribution to journalArticle

8 引用 (Scopus)

Deposition of cluster-free P-doped a-Si:H films using SiH4+PH3 multi-hollow discharge plasma CVD

Koga, K., Nakahara, K., Kim, Y. W., Kawashima, Y., Matsunaga, T., Sato, M., Yamashita, D., Matsuzaki, H., Uchida, G., Kamataki, K., Itagaki, N. & Shiratani, M., 10 1 2011, : : Physica Status Solidi (C) Current Topics in Solid State Physics. 8, 10, p. 3013-3016 4 p.

研究成果: Contribution to journalArticle

2 引用 (Scopus)

Effects of photoirradiation in UV and VUV regions during plasma exposure to polymers

Cho, K., Setsuhara, Y., Takenaka, K., Shiratani, M., Sekine, M. & Hori, M., 8 1 2011, : : Thin Solid Films. 519, 20, p. 6810-6814 5 p.

研究成果: Contribution to journalArticle

13 引用 (Scopus)

Generation and surface modification of Si nano-particles using SiH 4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics

Koga, K., Uchida, G., Yamamoto, K., Sato, M., Kawashima, Y., Kamataki, K., Itagaki, N. & Shiratani, M., 2011, International Conference on Advances in Condensed and Nano Materials, ICACNM-2011. p. 27-30 4 p. (AIP Conference Proceedings; 巻数 1393).

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

Highly conducting and very thin ZnO: AI films with ZnO buffer layer fabricated by solid phase crystallization from amorphous phase

Itagaki, N., Kuwahara, K., Nakahara, K., Yamashita, D., Uchida, G., Koga, K. & Shiratani, M., 1 1 2011, : : Applied Physics Express. 4, 1, 011101.

研究成果: Contribution to journalArticle

55 引用 (Scopus)

Hybrid sensitized solar cells using Si nanoparticles and ruthenium dye

Uchida, G., Kawashima, Y., Yamamoto, K., Sato, M., Nakahara, K., Matsunaga, T., Yamashita, D., Matsuzaki, H., Kamataki, K., Itagaki, N., Koga, K., Kondo, M. & Shiratani, M., 10 1 2011, : : Physica Status Solidi (C) Current Topics in Solid State Physics. 8, 10, p. 3021-3024 4 p.

研究成果: Contribution to journalArticle

7 引用 (Scopus)
10 引用 (Scopus)

Nano-factories in plasma: Present status and outlook

Shiratani, M., Koga, K., Iwashita, S., Uchida, G., Itagaki, N. & Kamataki, K., 5 4 2011, : : Journal of Physics D: Applied Physics. 44, 17, 174038.

研究成果: Contribution to journalArticle

24 引用 (Scopus)

Plasma processing of soft materials for development of flexible devices

Setsuhara, Y., Cho, K., Takenaka, K., Shiratani, M., Sekine, M. & Hori, M., 8 1 2011, : : Thin Solid Films. 519, 20, p. 6721-6726 6 p.

研究成果: Contribution to journalArticle

12 引用 (Scopus)

Preface: Phys. Status Solidi C 10/2011

Shiratani, M., 10 1 2011, : : Physica Status Solidi (C) Current Topics in Solid State Physics. 8, 10, p. 2975-2977 3 p.

研究成果: Contribution to journalEditorial

Redox characteristics of thiol compounds using radicals produced by water vapor radio frequency discharge

Hayashi, N., Nakahigashi, A., Goto, M., Kitazaki, S., Koga, K. & Shiratani, M., 8 1 2011, : : Japanese journal of applied physics. 50, 8 PART 2, 08JF04.

研究成果: Contribution to journalArticle

16 引用 (Scopus)

Surface nitridation of silicon nano-particles using double multi-hollow discharge plasma CVD

Uchida, G., Yamamoto, K., Kawashima, Y., Sato, M., Nakahara, K., Kamataki, K., Itagaki, N., Koga, K., Kondo, M. & Shiratani, M., 10 1 2011, : : Physica Status Solidi (C) Current Topics in Solid State Physics. 8, 10, p. 3017-3020 4 p.

研究成果: Contribution to journalArticle

15 引用 (Scopus)