A deep microfluidic absorbance detection cell replicated from a thickly stacked SU-8 dry film resist mold

Daisuke Onoshima, Jun Wang, Michihiko Aki, Kenji Arinaga, Noritada Kaji, Manabu Tokeshi, Shozo Fujita, Naoki Yokoyama, Yoshinobu Baba

研究成果: Contribution to journalArticle

6 被引用数 (Scopus)

抄録

Dry film resist SU-8 was used to make a thick mold for soft lithography of a poly(dimethylsiloxane) (PDMS) microfluidic chip with deep channels. The stacking of the SU-8 film enabled an ultra-thick (up to 500 μm) resist process on Si wafer. This process was fast and highly reproducible compared with the conventional liquid SU-8 process. The deep channel in the PDMS chip was utilized as a micro-flow cell for sensitive absorbance measurement. Sunset Yellow FCF dye was used to demonstrate absorption spectroscopy in the deep channel. Since the channel depth was proportional to the optical path length, which was proportional to the absorbance value, the PDMS chip achieved a detection limit (15.9 μM) comparable to U- or Z-shaped microfabricated absorbance detection cells in glass. Calibration curves for different solution concentrations were obtained with good R2 values (∼1).

本文言語英語
ページ(範囲)4368-4372
ページ数5
ジャーナルAnalytical Methods
4
12
DOI
出版ステータス出版済み - 12 1 2012
外部発表はい

All Science Journal Classification (ASJC) codes

  • Analytical Chemistry
  • Chemical Engineering(all)
  • Engineering(all)

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