A depth profile fitting model for a commercial total reflection X-ray fluorescence spectrometer

Yoshihiro Mori, Kenichi Uemura, Kengo Shimanoe

研究成果: ジャーナルへの寄稿記事

6 引用 (Scopus)

抄録

We have proposed a practical depth profiling model for a commercial Total Reflection X-Ray Fluorescence (TXRF) spectrometry instrument. The model includes three factors peculiar to a commercial TXRF instrument: (a) the irradiated X-ray photon density on the sample surface depends on a glancing angle, (b) the X-ray irradiated area becomes smaller than the detector view over a certain glancing angle, and (c) the incident X-ray has angular divergence. This model was optimized by comparing the measured Si-Ka for a silicon wafer with the calculated one. The results indicated that all of the three factors are indispensable for our instrument. We have applied this model to a surface contaminant and discussed its adequacy.

元の言語英語
ページ(範囲)823-828
ページ数6
ジャーナルSpectrochimica Acta - Part B Atomic Spectroscopy
52
発行部数7
DOI
出版物ステータス出版済み - 7 1 1997

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Spectrometers
Fluorescence
spectrometers
X rays
fluorescence
profiles
x rays
Depth profiling
photon density
Silicon wafers
adequacy
Photons
contaminants
Impurities
Detectors
divergence
wafers
detectors
silicon
spectroscopy

All Science Journal Classification (ASJC) codes

  • Analytical Chemistry
  • Atomic and Molecular Physics, and Optics
  • Instrumentation
  • Spectroscopy

これを引用

A depth profile fitting model for a commercial total reflection X-ray fluorescence spectrometer. / Mori, Yoshihiro; Uemura, Kenichi; Shimanoe, Kengo.

:: Spectrochimica Acta - Part B Atomic Spectroscopy, 巻 52, 番号 7, 01.07.1997, p. 823-828.

研究成果: ジャーナルへの寄稿記事

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