A depth profile fitting model for a commercial total reflection X-ray fluorescence spectrometer

Yoshihiro Mori, Kenichi Uemura, Kengo Shimanoe

研究成果: Contribution to journalArticle査読

6 被引用数 (Scopus)

抄録

We have proposed a practical depth profiling model for a commercial Total Reflection X-Ray Fluorescence (TXRF) spectrometry instrument. The model includes three factors peculiar to a commercial TXRF instrument: (a) the irradiated X-ray photon density on the sample surface depends on a glancing angle, (b) the X-ray irradiated area becomes smaller than the detector view over a certain glancing angle, and (c) the incident X-ray has angular divergence. This model was optimized by comparing the measured Si-Ka for a silicon wafer with the calculated one. The results indicated that all of the three factors are indispensable for our instrument. We have applied this model to a surface contaminant and discussed its adequacy.

本文言語英語
ページ(範囲)823-828
ページ数6
ジャーナルSpectrochimica Acta - Part B Atomic Spectroscopy
52
7
DOI
出版ステータス出版済み - 7 1 1997
外部発表はい

All Science Journal Classification (ASJC) codes

  • 分析化学
  • 原子分子物理学および光学
  • 器械工学
  • 分光学

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