抄録
An erasing method for repairing defective nanostructures generated in a dip-pen nanolithography (DPN) using conductive tip and conductive atomic force microscope (c-AFM) to electrochemically induce desorption is described. c-AFM would be used to selectively desorb portions of a monolayer-based structure made by DPN with alkanethiol inks on gold. c-AFM is used to selectively control the elimination of 16-mercaptohexadecanoic acid (MHA) nanostructures. This erasing technique can be coupled with DPN, and the eliminated MHA features can be backfilled with a new ink by simply coating the cantilever with the desired molecule. This procedure results in the elimination of the MHA-based triangle and replacement with a 11-ferrocenyl-1-undecanethiol (FUT) based compound without a damage to the 1-octadecanethiol (ODT)-coated regions of the substrate.
本文言語 | 英語 |
---|---|
ページ(範囲) | 600-605 |
ページ数 | 6 |
ジャーナル | Small |
巻 | 3 |
号 | 4 |
DOI | |
出版ステータス | 出版済み - 4月 2007 |
外部発表 | はい |
!!!All Science Journal Classification (ASJC) codes
- バイオテクノロジー
- 生体材料
- 化学 (全般)
- 材料科学(全般)