A new anode-electrode structure for sputter deposition of high-quality y-ba-cu-o thin films

Takanobu Kisu, Yuji Ariyoshi, Keiji Enpuku, Keiji Yoshida, Masakatsu Takeo, Kaoru Yamafuji

研究成果: Contribution to journalArticle査読

7 被引用数 (Scopus)

抄録

A new structure of the anode electrode is presented for sputter deposition of Y-Ba-Cu-O thin films. The present anode electrode is expected to reduce the damage due to charged particles incident on the film surface. Using this method, high-quality films with very smooth surfaces and critical current density as large as jC(4.2 K)=2.1×107A/cm2can be obtained reproducibly.

本文言語英語
ページ(範囲)L1385-L1388
ジャーナルJapanese Journal of Applied Physics
28
8 A
DOI
出版ステータス出版済み - 8 1 1989

All Science Journal Classification (ASJC) codes

  • 工学(全般)
  • 物理学および天文学(全般)

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