A new positive working alkaline developable photoresist based on a simple amorphous molecule, tri(3,5-di-tert-butoxycarbonyloxybenzyl) 1,3,5-benzenetricarboxylate and a photoacid generator

Tsuyohiko Fujigaya, Yuji Shibasaki, Mitsuru Ueda

研究成果: Contribution to journalArticle査読

13 被引用数 (Scopus)

抄録

A simple amorphous molecule, tri(3,5-di-tert-butoxycarbonyloxybenzyl) 1,3,5- benzenetetracarboxylate (4) was prepared from 1,3,5-benzenetricarbonyl trichloride (3) and 3,5-di(tert-butoxycarbonyloxy)benzyl alcohol (2). Compound 4 can form an uniform transparent film by spin-casting on silicone wafer and the film has a good transparency above 300 nm wavelength. The chemically amplified photoresist system based on 4 containing 5 wt% of diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate (DIAS) showed a sensitivity of 19 mJ/cm2 and a contrast of 17 with 365 nm light.

本文言語英語
ページ(範囲)275-280
ページ数6
ジャーナルJournal of Photopolymer Science and Technology
14
2
DOI
出版ステータス出版済み - 2001
外部発表はい

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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