Mask pattern image is engraved into polymethylmethacrylate (PMMA) film after SR light irradiation, and additional thermal treatment makes it deeper. PMMA molecular weight distribution was measured by using gel permeation chromatography (GPC) after each process. GPC measurement showed that PMMA molecular weight became lower after SR exposure, and lower PMMA molecules than M.W. 7,000 disappeared from the film thoroughly after thermal development at 135°C in vacuum. Comparing the density measured by microbalance with the refractive index by elipsometry, the change of molecular composition in PMMA might occur by SR irradiation.
|ジャーナル||Research Reports on Information Science and Electrical Engineering of Kyushu University|
|出版ステータス||出版済み - 2001|
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