A study for thermal development of PMMA after SR exposure using GPC

Tsuyoshi Fujimura, Yukinori Kuroki, Akihiro Ikeda, Reiji Hattori, Suk Sang Chang

研究成果: Contribution to journalArticle査読

抄録

Mask pattern image is engraved into polymethylmethacrylate (PMMA) film after SR light irradiation, and additional thermal treatment makes it deeper. PMMA molecular weight distribution was measured by using gel permeation chromatography (GPC) after each process. GPC measurement showed that PMMA molecular weight became lower after SR exposure, and lower PMMA molecules than M.W. 7,000 disappeared from the film thoroughly after thermal development at 135°C in vacuum. Comparing the density measured by microbalance with the refractive index by elipsometry, the change of molecular composition in PMMA might occur by SR irradiation.

本文言語英語
ページ(範囲)134-135
ページ数2
ジャーナルResearch Reports on Information Science and Electrical Engineering of Kyushu University
6
1
出版ステータス出版済み - 2001
外部発表はい

All Science Journal Classification (ASJC) codes

  • 電子工学および電気工学
  • ハードウェアとアーキテクチャ
  • 工学(その他)

フィンガープリント

「A study for thermal development of PMMA after SR exposure using GPC」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル