Active mask UV lithography systme for MEMS and μTAS applications

Terutake Hayashi, Takayuki Shibata, Takahiro Kawashima, Eiji Makino, Takashi Mineta, Toru Masuzawa

研究成果: 著書/レポートタイプへの貢献会議での発言

元の言語英語
ホスト出版物のタイトルProceedings of the 21st Annual ASPE Meeting, ASPE 2006
出版物ステータス出版済み - 12 1 2006
イベント21st Annual Meeting of the American Society for Precision Engineering, ASPE 2006 - Monterey, CA, 米国
継続期間: 10 15 200610 20 2006

出版物シリーズ

名前Proceedings of the 21st Annual ASPE Meeting, ASPE 2006

その他

その他21st Annual Meeting of the American Society for Precision Engineering, ASPE 2006
米国
Monterey, CA
期間10/15/0610/20/06

Fingerprint

Lithography
MEMS
Masks

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering

これを引用

Hayashi, T., Shibata, T., Kawashima, T., Makino, E., Mineta, T., & Masuzawa, T. (2006). Active mask UV lithography systme for MEMS and μTAS applications. : Proceedings of the 21st Annual ASPE Meeting, ASPE 2006 (Proceedings of the 21st Annual ASPE Meeting, ASPE 2006).

Active mask UV lithography systme for MEMS and μTAS applications. / Hayashi, Terutake; Shibata, Takayuki; Kawashima, Takahiro; Makino, Eiji; Mineta, Takashi; Masuzawa, Toru.

Proceedings of the 21st Annual ASPE Meeting, ASPE 2006. 2006. (Proceedings of the 21st Annual ASPE Meeting, ASPE 2006).

研究成果: 著書/レポートタイプへの貢献会議での発言

Hayashi, T, Shibata, T, Kawashima, T, Makino, E, Mineta, T & Masuzawa, T 2006, Active mask UV lithography systme for MEMS and μTAS applications. : Proceedings of the 21st Annual ASPE Meeting, ASPE 2006. Proceedings of the 21st Annual ASPE Meeting, ASPE 2006, 21st Annual Meeting of the American Society for Precision Engineering, ASPE 2006, Monterey, CA, 米国, 10/15/06.
Hayashi T, Shibata T, Kawashima T, Makino E, Mineta T, Masuzawa T. Active mask UV lithography systme for MEMS and μTAS applications. : Proceedings of the 21st Annual ASPE Meeting, ASPE 2006. 2006. (Proceedings of the 21st Annual ASPE Meeting, ASPE 2006).
Hayashi, Terutake ; Shibata, Takayuki ; Kawashima, Takahiro ; Makino, Eiji ; Mineta, Takashi ; Masuzawa, Toru. / Active mask UV lithography systme for MEMS and μTAS applications. Proceedings of the 21st Annual ASPE Meeting, ASPE 2006. 2006. (Proceedings of the 21st Annual ASPE Meeting, ASPE 2006).
@inproceedings{19a09c072d88482d98dddd992a1bac58,
title = "Active mask UV lithography systme for MEMS and μTAS applications",
author = "Terutake Hayashi and Takayuki Shibata and Takahiro Kawashima and Eiji Makino and Takashi Mineta and Toru Masuzawa",
year = "2006",
month = "12",
day = "1",
language = "English",
isbn = "1887706410",
series = "Proceedings of the 21st Annual ASPE Meeting, ASPE 2006",
booktitle = "Proceedings of the 21st Annual ASPE Meeting, ASPE 2006",

}

TY - GEN

T1 - Active mask UV lithography systme for MEMS and μTAS applications

AU - Hayashi, Terutake

AU - Shibata, Takayuki

AU - Kawashima, Takahiro

AU - Makino, Eiji

AU - Mineta, Takashi

AU - Masuzawa, Toru

PY - 2006/12/1

Y1 - 2006/12/1

UR - http://www.scopus.com/inward/record.url?scp=84884810802&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84884810802&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:84884810802

SN - 1887706410

SN - 9781887706414

T3 - Proceedings of the 21st Annual ASPE Meeting, ASPE 2006

BT - Proceedings of the 21st Annual ASPE Meeting, ASPE 2006

ER -