The several types of advanced oxidation processes (AOPs) utilizing UV light, ozone and hydrogen peroxide have been studied to remove both organic and inorganic compounds from water and air. One of the AOPs, UV-ozonation process utilizing the excimer lamp was developed for water purification. The UV light emitted from KrCl excimer with the wavelength of 222nm that destructs the hydrogen peroxide to hydroxyl radical realizes the AOPs. The ability of the AOPs with the excimer lamp was confirmed by the treatment of the humic acid solution.
|出版物ステータス||出版済み - 4 19 2004|
|イベント||The 4th International Symposium on Applied Plasma Science - Kyoto, 日本|
継続期間: 9 1 2003 → 9 5 2003
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces, Coatings and Films