Advanced oxidation processes (AOPs) assisted by excimer lamp

Tomokazu Ikematsu, Nobuya Hayashi, Satoshi Ihara, Saburoh Satoh, Chobei Yamabe

研究成果: ジャーナルへの寄稿Conference article

8 引用 (Scopus)

抜粋

The several types of advanced oxidation processes (AOPs) utilizing UV light, ozone and hydrogen peroxide have been studied to remove both organic and inorganic compounds from water and air. One of the AOPs, UV-ozonation process utilizing the excimer lamp was developed for water purification. The UV light emitted from KrCl excimer with the wavelength of 222nm that destructs the hydrogen peroxide to hydroxyl radical realizes the AOPs. The ability of the AOPs with the excimer lamp was confirmed by the treatment of the humic acid solution.

元の言語英語
ページ(範囲)579-582
ページ数4
ジャーナルVacuum
73
発行部数3-4
DOI
出版物ステータス出版済み - 4 19 2004
外部発表Yes
イベントThe 4th International Symposium on Applied Plasma Science - Kyoto, 日本
継続期間: 9 1 20039 5 2003

    フィンガープリント

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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