抄録
Advances in CMP Polishing Technologies demystifies scientific developments and technological innovations, opening them up for new applications and process improvements in the semiconductor industry and other areas of precision engineering.
本文言語 | 英語 |
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出版社 | Elsevier Inc. |
ISBN(印刷版) | 9781437778595 |
DOI | |
出版ステータス | 出版済み - 1月 1 2012 |
!!!All Science Journal Classification (ASJC) codes
- 工学(全般)