抄録
Advances in CMP Polishing Technologies demystifies scientific developments and technological innovations, opening them up for new applications and process improvements in the semiconductor industry and other areas of precision engineering.
| 本文言語 | 英語 |
|---|---|
| 出版社 | Elsevier Inc. |
| ISBN（印刷版） | 9781437778595 |
| DOI | |
| 出版ステータス | 出版済み - 1 1 2012 |
All Science Journal Classification (ASJC) codes
- 工学（全般）