Aggregation states of polystyrene (PS) and poly(methyl methacrylate) (PMMA) at hydrophobic deuterated-octadecyltrichlorosilane (OTS-d) and hydrophilic SiOx interfaces are discussed, focusing on the interaction strength between polymer and substrate. Sum-frequency generation spectroscopy revealed that PS exhibited oriented phenyl groups along the normal direction at the interface in a spin-coated film because of the centrifugal force generated during the film solidification process, whereas it did not in a solvent-cast film. This result was common for both hydrophobic and hydrophilic substrates. That is, the aggregation states of PS depended little on which kind of substrate was used. This is because the interaction between PS and the surfaces is weak. In the case of a PMMA film on the hydrophobic OTS-d substrate, the interfacial local conformation was also dependent on the method of film preparation. PMMA at the hydrophilic SiOx interface, however, exhibited oriented ester methyl groups along the direction normal to the interface, regardless of the film preparation method. This is due to a stronger interaction via hydrogen bonding between carbonyl groups of PMMA and the substrate surface.
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