All-Nb thin film microbridge-type Josephson junction for submillimeter-wave detection

Nobumitsu Hirose, Yuichi Harada, Matsuo Sekine, Shigeru Yoshimori, Mitsuo Kawamura

研究成果: ジャーナルへの寄稿記事

抄録

A copolymer of methyl methacrylate (MMA) and 3-triethoxysilylpropyl methacrylate (ESPMA) was proposed as a positive-working electron beam (EB) resist of a new type. It was found that it had 4-10 times the resistance of polymethylmethacrylate (PMMA) against CBrF3 plasma damage. The mechanism of etching Nb in reactive-ion-etching (RIE) was deciphered. Using the new EB resist and nanometer process technology, an all-Nb thin film microbridge was fabricated. It shows the a.c. Josephson effect, i.e. the Shapiro steps upto the 11th were observed under millimeter-wave (70 GHz) radiation. In addition the coherently working performance of the series array of these thin-film microbridges were observed definitively.

元の言語英語
ページ(範囲)445-455
ページ数11
ジャーナルInfrared Physics
34
発行部数5
DOI
出版物ステータス出版済み - 1 1 1993
外部発表Yes

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Submillimeter waves
submillimeter waves
Methacrylates
Josephson junctions
Electron beams
etching
electron beams
Thin films
Josephson effect
Reactive ion etching
Polymethyl Methacrylate
thin films
Millimeter waves
millimeter waves
Etching
copolymers
Copolymers
damage
Plasmas
Radiation

All Science Journal Classification (ASJC) codes

  • Engineering(all)

これを引用

All-Nb thin film microbridge-type Josephson junction for submillimeter-wave detection. / Hirose, Nobumitsu; Harada, Yuichi; Sekine, Matsuo; Yoshimori, Shigeru; Kawamura, Mitsuo.

:: Infrared Physics, 巻 34, 番号 5, 01.01.1993, p. 445-455.

研究成果: ジャーナルへの寄稿記事

Hirose, Nobumitsu ; Harada, Yuichi ; Sekine, Matsuo ; Yoshimori, Shigeru ; Kawamura, Mitsuo. / All-Nb thin film microbridge-type Josephson junction for submillimeter-wave detection. :: Infrared Physics. 1993 ; 巻 34, 番号 5. pp. 445-455.
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