Analysis of cluster growth in magnetron-sputtering metal-cluster source by optical emission spectroscopy

研究成果: Contribution to journalArticle査読

抄録

We investigate cluster-growth processes in a magnetronsputtering cluster source by employing silver as a target metal. An optical emission spectrum of discharge plasma is measured along with a mass spectrum of silver cluster cations as a function of discharge power. The former quantifies the number of silver atoms sputtered, while the latter provides a size distribution of clusters produced. A scenario of cluster growth is discussed based on a simple statistical model.

本文言語英語
ページ(範囲)1537-1540
ページ数4
ジャーナルChemistry Letters
48
12
DOI
出版ステータス出版済み - 2019

All Science Journal Classification (ASJC) codes

  • 化学 (全般)

フィンガープリント

「Analysis of cluster growth in magnetron-sputtering metal-cluster source by optical emission spectroscopy」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル