TY - JOUR
T1 - Application of microwave plasma gate oxidation to strained-Si/SiGe-on- insulator
AU - Nishisaka, Mika
AU - Asano, Tanemasa
PY - 2006/4/25
Y1 - 2006/4/25
N2 - We have applied microwave-plasma oxidation at 400°C to the gate oxide formation of a strained-Si/SiGe-on-insulator (SGOI) metal-oxide-semiconductor field-effect transistor (MOSFET). Application of low-temperature wet-O 2 treatment to plasma oxide on strained-Si/Si0.85Ge 0.15 significantly reduces the density of interface states and provides a 72% enhancement in transconductance compared with Si control devices. In the case of a thermally oxidized device, the junction leakage current was increased due to Ge condensation up to 50% Ge at the mesa island edge. On the other hand, the plasma oxide device showed a leakage current two orders of magnitude lower than that of the thermally oxidized device, owing to the suppression of the Ge condensation.
AB - We have applied microwave-plasma oxidation at 400°C to the gate oxide formation of a strained-Si/SiGe-on-insulator (SGOI) metal-oxide-semiconductor field-effect transistor (MOSFET). Application of low-temperature wet-O 2 treatment to plasma oxide on strained-Si/Si0.85Ge 0.15 significantly reduces the density of interface states and provides a 72% enhancement in transconductance compared with Si control devices. In the case of a thermally oxidized device, the junction leakage current was increased due to Ge condensation up to 50% Ge at the mesa island edge. On the other hand, the plasma oxide device showed a leakage current two orders of magnitude lower than that of the thermally oxidized device, owing to the suppression of the Ge condensation.
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U2 - 10.1143/JJAP.45.2914
DO - 10.1143/JJAP.45.2914
M3 - Article
AN - SCOPUS:33646913578
VL - 45
SP - 2914
EP - 2918
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 4 B
ER -