Argon dilution effects on diamond deposition in electron cyclotron resonance plasma: A double probe study

K. Teii, H. Yoshioka, S. Ono, S. Teii

研究成果: Contribution to journalArticle査読

2 被引用数 (Scopus)

抄録

The Ar dilution effects on diamond deposition at moderate pressures (26.6-400 Pa) in an electron cyclotron resonance hydrogen-methane plasma have been studied in connection with electron temperature (Te) and electron density (ne). The double probe measurement revealed the dependence of Te and ne on Ar concentration, pressure, and microwave power. Te decreased in proportion to Ar concentration and was in the range of 3.7-7.5 eV. In contrast, ne exhibited only a small change with increasing Ar concentration except at a higher pressure and was on the order of 1010-1011 cm-3. The Ar dilution promoted nucleation rather than growth, as shown by an increase in nucleation density and renucleation on preexisting diamond grains. The mechanism leading to the peaked growth rate at 33-50 vol.% Ar was explained by the variation of the ion-bombardment energy and the fluxes of radicals, based on the measured Te and ne.

本文言語英語
ページ(範囲)63-67
ページ数5
ジャーナルThin Solid Films
437
1-2
DOI
出版ステータス出版済み - 8 1 2003

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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