ATOM-PROBE STUDY OF THE EARLY STAGE OF SILICIDE FORMATION. I. W-Si SYSTEM.

Osamu Nishikawa, Yoshitaka Tsunashima, Eiichi Nomura, Shiro Horie, Minoru Wada, Mezame Shibata, Toshihiko Yoshimura, Ryuji Uemori

研究成果: ジャーナルへの寄稿学術誌査読

29 被引用数 (Scopus)

抄録

The early stage of silicide formation was studied by depositing Si on W tip specimens of the FIM and the atom probe. The optimum temperature for W silicide formation was found to be 900-1000 K and its composition was WSi//2. The observed FIM image of the silicide agreed well with the computer-simulated image which was composed of the W atoms of the tetragonal C 11b structure. The silicide often grew independently on each W left brace 001 right brace plane because the W lattice constant of these planes matches well with that of the basal plane of the silicide. The boundary between the independently grown silicides was also observed along the expected areas from the simulated image.

本文言語英語
ページ(範囲)6-9
ページ数4
ジャーナルJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
1
1
DOI
出版ステータス出版済み - 1月 1 1983
外部発表はい

!!!All Science Journal Classification (ASJC) codes

  • 凝縮系物理学
  • 電子工学および電気工学

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