Atomic layer deposition of aluminum (111) thin film by dimethylethylaminealane precursor

Chemistry

• Aluminum 100%
• Application 8%
• Atomic Layer Epitaxy 33%
• Deposition Technique 25%
• Device 8%
• Lattice Parameter 8%
• Liquid Film 8%
• Potential 8%
• Procedure 8%
• Superconductive Transition Temperature 8%

Material Science

• Lattice Constant 8%
• Liquid Films 8%
• Thin Films 50%
• Titanium 16%

Biochemistry, Genetics and Molecular Biology

• Electric Potential 8%
• Growth 8%
• Precursor 33%
• Transition Temperature 8%
• Volume 8%