Atomically-coherent-coalescence of two growth-fronts in Ge stripes on insulator by rapid-melting lateral-crystallization

Masashi Kurosawa, Kaoru Toko, Taizoh Sadoh, Ichiro Mizushim, Masanobu Miyao

研究成果: Contribution to journalArticle査読

4 被引用数 (Scopus)

抄録

High-quality Ge-on-insulator (GOI) is a key structure for integrating high-speed transistors and optical- and spintronic-devices on Si-platform. Effects of coalescence of two growth-fronts on crystallinity of GOI-stripes during rapid-melting lateral-crystallization are investigated as a function of growth-distance. For long growth-distance (≥150 μm), grain-boundaries are generated in coalesced regions due to tilting growth-fronts (1-3°). On the other hand, for short distance (≤5 μm), lattice-structures coherently align without strains. Moreover, for intermediate distance (5-150 μm), lattice-structures of growth-fronts coherently align without any defects, though heterogeneous lattice-strains are locally induced due to slightly tilting growth-fronts (∼0.5°). Such atomically-coherentcoalescence for growth-distance <150 μm shows significant advantage of rapid-melting-crystallization over vapor and solid-phase techniques.

本文言語英語
ページ(範囲)P54-P57
ジャーナルECS Journal of Solid State Science and Technology
2
3
DOI
出版ステータス出版済み - 2013

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料

フィンガープリント

「Atomically-coherent-coalescence of two growth-fronts in Ge stripes on insulator by rapid-melting lateral-crystallization」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル