Behavior of deuterium retention and surface morphology for VPS-W/F82H

Yasuhisa Oya, Masashi Shimada, Tomonori Tokunaga, Hideo Watanabe, Naoaki Yoshida, Yuji Hatano, Ryuta Kasada, Takuya Nagasaka, Akihiko Kimura, Kenji Okuno

研究成果: Contribution to journalArticle査読

4 被引用数 (Scopus)

抄録

The deuterium (D) retention for Vacuum Plasma Spray (VPS)-tungsten (W)/F82H was studied using two different implantation methods, namely D plasma exposure and D2+ implantation. The D retention for polished VPS-W/F82H after plasma exposure was found to be reduced compared to that for polycrystalline tungsten. Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) observations indicated that porous structures around grain boundaries and the interface between VPS-W layers would be potential D diffusion paths, leading to low D retention. In the case of D2+ implantation, the shape of D2 TDS spectrum was almost the same as that for D plasma-exposed VPS-W/F82H; however, the D retention was quite high for unpolished VPS-W/F82H, indicating that most of D was trapped by the oxide layer, which was produced by the VPS process. The reduction of surface area due to the polishing process also reduces D retention for VPS-W/F82H. These results indicate that controlling the surface chemical states is important for the reduction of tritium retention for future fusion reactors.

本文言語英語
ページ(範囲)S242-S245
ジャーナルJournal of Nuclear Materials
442
1-3 SUPPL.1
DOI
出版ステータス出版済み - 2013

All Science Journal Classification (ASJC) codes

  • 核物理学および高エネルギー物理学
  • 材料科学(全般)
  • 原子力エネルギーおよび原子力工学

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