Bonding of lithium niobate to silicon in ambient air using laser irradiation

Hiroki Kawano, Ryo Takigawa, Hiroshi Ikenoue, Tanemasa Asano

研究成果: Contribution to journalArticle査読

5 被引用数 (Scopus)

抄録

In this paper, we introduce a bonding method in ambient air using laser irradiation to the face-to-face interface of dissimilar materials. This method is performed while keeping whole wafers of the materials at room temperature. We demonstrate the bonding of LiNbO3 to Si using pulsed nanosecond green laser irradiation. Laser use can minimize thermal stress owing to a large thermal expansion mismatch. The bonding characteristic obtained by an irradiation laser up to 2.5 J/cm2 in fluence is investigated. It is found that a LiNbO3 chip is strongly bonded to a Si chip by setting the laser fluence at the optimum range. A bond strength of over 2MPa, which may be enough for the device applications, can be obtained.

本文言語英語
論文番号08RB09
ジャーナルJapanese journal of applied physics
55
8
DOI
出版ステータス出版済み - 8 2016

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

フィンガープリント 「Bonding of lithium niobate to silicon in ambient air using laser irradiation」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル