Character projection mask set optimization for enhancing throughput of MCC projection systems

Makoto Sugihara, Yusuke Matsunaga, Kazuaki Murakami

研究成果: Contribution to journalArticle査読

2 被引用数 (Scopus)

抄録

Character projection (CP) lithography is utilized for maskless lithography and is a potential for the future photomask manufacture because it can project ICs much faster than point beam projection or variable-shaped beam (VSB) projection. In this paper, we first present a projection mask set development methodology for multi-column-cell (MCC) systems, in which column-cells can project patterns in parallel with the CP and VSB lithographies. Next, we present an INLP (integer nonlinear programming) model as well as an ILP (integer linear programming) model for optimizing a CP mask set of an MCC projection system so that projection time is reduced. The experimental results show that our optimization has achieved 33.4% less projection time in the best case than a naive CP mask development approach. The experimental results indicate that our CP mask set optimization method has virtually increased cell pattern objects on CP masks and has decreased VSB projection so that it has achieved higher projection throughput than just parallelizing two column-cells with conventional CP masks.

本文言語英語
ページ(範囲)3451-3460
ページ数10
ジャーナルIEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences
E91-A
12
DOI
出版ステータス出版済み - 1 1 2008

All Science Journal Classification (ASJC) codes

  • 信号処理
  • コンピュータ グラフィックスおよびコンピュータ支援設計
  • 応用数学
  • 電子工学および電気工学

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