Characteristics of bloch line pair propagation with cr bit pattern

Hironori Asada, Junichi Yamato, Satoru Ikeda, Kimihide Matsuyama

研究成果: Contribution to journalArticle

抜粋

The artificial stress-induced anisotropy in a liquid phase epitaxial garnet film has been studied aiming at the application to a bit confinement pattern in Bloch line memory. The potential well for a vertical Bloch line (VBL) pair generated by the stress-induced anisotropy variation has been computed. VBL bit propagation is studied experimentally for a test chip with the stress-induced bit positions. The bit propagation was successfully performed under the Cr bit pattern with a periodic film thickness variation of 0.08 ym by applying the drive pulses with rise time shorter than 100 ns and fall time longer than 1000 ns.

元の言語英語
ページ(範囲)L1644-L1646
ジャーナルJapanese journal of applied physics
30
発行部数9
DOI
出版物ステータス出版済み - 9 1991

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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