Characteristics of RF H- ion source by using FET power source

A. Ando, C. H. Moon, J. Komuro, K. Tsumori, Y. Takeiri

研究成果: ジャーナルへの寄稿Conference article

3 引用 (Scopus)

抄録

Characteristics of radio frequency(rf) plasma production are investigated using a FET inverter power supply as an rf generator. The matching circuit in the inverter system is simple compared to a conventional 50 Ohm matching system and only an imaginary part of the impedance of rf transmission should be matched by adjusting operating frequency or capacitance of the circuit. An electron density over 1018m-3 is produced in argon plasma with lkW rf power. Lower densities are obtained in helium and hydrogen plasmas compared to the argon plasma. Effect of axial magnetic field in driver region is examined. Electron density more than 1018m-3 is obtained at the hydrogen gas pressure around lPa with the help of the axial magnetic field.

元の言語英語
ページ(範囲)291-296
ページ数6
ジャーナルAIP Conference Proceedings
1097
DOI
出版物ステータス出版済み - 5 5 2009
外部発表Yes
イベント1st International Symposium on Negative Ions, Beams and Sources - Aix-en-Provence, フランス
継続期間: 9 9 20089 12 2008

Fingerprint

ion sources
radio frequencies
field effect transistors
argon plasma
helium plasma
hydrogen plasma
magnetic fields
power supplies
gas pressure
generators
capacitance
adjusting
impedance
hydrogen

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

これを引用

Characteristics of RF H- ion source by using FET power source. / Ando, A.; Moon, C. H.; Komuro, J.; Tsumori, K.; Takeiri, Y.

:: AIP Conference Proceedings, 巻 1097, 05.05.2009, p. 291-296.

研究成果: ジャーナルへの寄稿Conference article

Ando, A. ; Moon, C. H. ; Komuro, J. ; Tsumori, K. ; Takeiri, Y. / Characteristics of RF H- ion source by using FET power source. :: AIP Conference Proceedings. 2009 ; 巻 1097. pp. 291-296.
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