Chemical stability improvement in IGZO using selective laser annealing system

Tetsuya Goto, Kaori Saito, Fuminobu Imaizumi, Michinobu Mizumura, Akira Suwa, Hiroshi Ikenoue, Shigetoshi Sugawa

研究成果: Contribution to journalConference article査読

1 被引用数 (Scopus)

抄録

Selective laser annealing system using KrF excimer laser was applied to amorphous IGZO films. IGZO film was crystallized for the laser-irradiated area (60µm square), where the chemical stability against acid solutions was improved. The stability against the negative bias illumination stress for the laser-treated TFT was improved. Furthermore, TFT could be fabricated without the photo lithography for the island patterning.

本文言語英語
ページ(範囲)604-607
ページ数4
ジャーナルDigest of Technical Papers - SID International Symposium
48
1
DOI
出版ステータス出版済み - 2017
イベントSID Symposium, Seminar, and Exhibition 2017, Display Week 2017 - Los Angeles, 米国
継続期間: 5 21 20175 26 2017

All Science Journal Classification (ASJC) codes

  • Engineering(all)

フィンガープリント 「Chemical stability improvement in IGZO using selective laser annealing system」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル