Cluster-eliminating filter for depositing cluster-free a-Si:H films by plasma chemical vapor deposition

Kazunori Koga, Naoto Kaguchi, Kouki Bando, Masaharu Shiratani, Yukio Watanabe

研究成果: Contribution to journalReview article査読

18 被引用数 (Scopus)

抄録

A cluster-eliminating filter is developed to reduce a volume fraction VF of amorphous silicon nanoparticles above approximately 1 nm in size (referred to as a cluster) incorporated into a-Si:H films. The filter reduces the VF value by using the difference between a sticking probability of clusters and a surface reaction probability of SiH3 radicals, which are the predominant deposition radicals. By employing the filter together with a cluster-suppressed plasma chemical vapor deposition reactor, the VF value is reduced below 1180 compared to that for the conventional device quality films. Such cluster-free a-Si:H films have an extremely small hydrogen concentration associated with Si- H2 bonds below 5.46× 10-3 at. %.

本文言語英語
論文番号113501
ページ(範囲)1-4
ページ数4
ジャーナルReview of Scientific Instruments
76
11
DOI
出版ステータス出版済み - 12 12 2005

All Science Journal Classification (ASJC) codes

  • Instrumentation

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