Comparison between Ar+CH4 cathode and anode coupling chemical vapor depositions of hydrogenated amorphous carbon films
Sung Hwa Hwang, Ryosuke Iwamoto, Takamasa Okumura, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Tatsuyuki Nakatani, Masaharu Shiratani
研究成果: ジャーナルへの寄稿 › 学術誌 › 査読
4
被引用数
(Scopus)