The effectiveness of hierarchical data processing capabilities using Anaheim, a 70 nm system-on-a-chip (SoC) devices in electron projection lithography (EPL) was analyzed. Selete's 10 PC-clustered hierarchical data processing system was used to reduce the data processing time and output data volume of a complementary split by M-Split from 57 to 7.7 min and from 12.4 to 1.7 Gb. The complementary exposure of the Anaheim using Nikon's electron beam (EB) stepper, NSR-EB1A and a high-performance Si stencil mask fabricated by HOYA was performed. The results show that the complementary exposure technique, including a complementary mask pattern split and stencil mask fabrication, is no longer a critical issue for EPL.
|ジャーナル||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|出版物ステータス||出版済み - 11 1 2003|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering