Control of the electron temperature by varying the resonance zone width in ECR plasma

Naho Itagaki, H. Muta, N. Ishii, Y. Kawai

研究成果: ジャーナルへの寄稿Conference article

1 引用 (Scopus)

抜粋

The electron temperature (Te) in an electron cyclotron resonance plasma is clarified to depend on the spatial profiles of the microwave-power absorption by both the electromagnetic-waves measurement and the simulation of microwave power absorption. It is found that Te is controlled by varying the magnetic field configuration and/or the microwave frequency since the power absorption profile is influenced by the effective resonance width. In fact, Te is observed to decrease with decreasing the magnetic field gradient at the resonance point for N2, Ar and O2/Ar plasma.

元の言語英語
ページ(範囲)59-63
ページ数5
ジャーナルThin Solid Films
457
発行部数1
DOI
出版物ステータス出版済み - 6 1 2004
イベント16th Symposium on Plasma Science for Materials (SPSM-16) - Tokyo, 日本
継続期間: 6 4 20036 5 2003

    フィンガープリント

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

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