Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si

Byoung Min Lee, Baek Seok Seong, Hak Rho Kim, Shinji Munetoh, Teruaki Motooka

研究成果: 著書/レポートタイプへの貢献会議での発言

抄録

To investigate the cooling mechanism and the local structural changes of excimer laser-annealed silicon (Si), molecular dynamics (MD) simulations were performed. Heat flow of molten Si showed a strong dependency of the local region during a natural cooling. An amorphous-to-liquid transition near an interface in the temperature range of 1600 K ∼ 1800 K was expected with the results of the local diffusion coefficients calculated by integrating the velocity autocorrelation functions. It was confirmed that the structure of the interface region affected the cooling rate of the overall system. The structural properties at the various local regions after a cooling were assessed in terms of the configurational properties including the coordination and bond-angle distributions. A spontaneous nucleation of Si near a interface was observed during a natural cooling.

元の言語英語
ホスト出版物のタイトルMultiscale Modeling of Materials
ページ225-230
ページ数6
978
出版物ステータス出版済み - 12 1 2006
イベント2006 MRS Fall Meeting - Boston, MA, 米国
継続期間: 11 27 200612 1 2006

その他

その他2006 MRS Fall Meeting
米国
Boston, MA
期間11/27/0612/1/06

Fingerprint

Excimer lasers
Silicon
excimer lasers
Cooling
cooling
silicon
Autocorrelation
heat transmission
autocorrelation
Molecular dynamics
Molten materials
Structural properties
Nucleation
diffusion coefficient
nucleation
molecular dynamics
Heat transfer
Computer simulation
Liquids
liquids

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

これを引用

Lee, B. M., Seong, B. S., Kim, H. R., Munetoh, S., & Motooka, T. (2006). Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si. : Multiscale Modeling of Materials (巻 978, pp. 225-230)

Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si. / Lee, Byoung Min; Seong, Baek Seok; Kim, Hak Rho; Munetoh, Shinji; Motooka, Teruaki.

Multiscale Modeling of Materials. 巻 978 2006. p. 225-230.

研究成果: 著書/レポートタイプへの貢献会議での発言

Lee, BM, Seong, BS, Kim, HR, Munetoh, S & Motooka, T 2006, Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si. : Multiscale Modeling of Materials. 巻. 978, pp. 225-230, 2006 MRS Fall Meeting, Boston, MA, 米国, 11/27/06.
Lee BM, Seong BS, Kim HR, Munetoh S, Motooka T. Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si. : Multiscale Modeling of Materials. 巻 978. 2006. p. 225-230
Lee, Byoung Min ; Seong, Baek Seok ; Kim, Hak Rho ; Munetoh, Shinji ; Motooka, Teruaki. / Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si. Multiscale Modeling of Materials. 巻 978 2006. pp. 225-230
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