Current understanding of mechanism of thermally activated delayed fluorescence: RISC beyond S-T energy gap

Takuya Hosokai, Hiroyuki Matsuzaki, Hajime Nakanotani, Chihaya Adachi

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

抜粋

A mechanism of thermally activated delayed fluorescence (TADF) beyond the ordinary discussion of reverse intersystem crossing (RISC) determined by the energy gap between excited singlet (Si) and triplet (Ti) states is introduced. A new design strategy of highly efficient TADF materials will also be proposed.

元の言語英語
ホスト出版物のタイトル24th International Display Workshops, IDW 2017
出版者International Display Workshops
ページ690-693
ページ数4
ISBN(電子版)9781510858992
出版物ステータス出版済み - 1 1 2017
イベント24th International Display Workshops, IDW 2017 - Sendai, 日本
継続期間: 12 6 201712 8 2017

出版物シリーズ

名前Proceedings of the International Display Workshops
1
ISSN(印刷物)1883-2490

その他

その他24th International Display Workshops, IDW 2017
日本
Sendai
期間12/6/1712/8/17

All Science Journal Classification (ASJC) codes

  • Computer Vision and Pattern Recognition
  • Human-Computer Interaction
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Radiology Nuclear Medicine and imaging

フィンガープリント Current understanding of mechanism of thermally activated delayed fluorescence: RISC beyond S-T energy gap' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用

    Hosokai, T., Matsuzaki, H., Nakanotani, H., & Adachi, C. (2017). Current understanding of mechanism of thermally activated delayed fluorescence: RISC beyond S-T energy gap. : 24th International Display Workshops, IDW 2017 (pp. 690-693). (Proceedings of the International Display Workshops; 巻数 1). International Display Workshops.