Deep impurity levels and diffusion coefficient of manganese in silicon

H. Nakashima, K. Hashimoto

    研究成果: Contribution to journalArticle査読

    24 被引用数 (Scopus)

    抄録

    Manganese-related deep levels in n- and p-type silicon have been investigated by deep level transient spectroscopy and Hall effect. Two electron traps of Ec-(0.12±0.01) eV and Ec-(0.41±0. 01) eV, and a hole trap of Ev+(0.32±0.01) eV are found in manganese-doped silicon. The energy levels of these traps correspond to the transitions between four charge states (Mn-, Mn0, Mn +, Mn++) of interstitial manganese. An additional donor-type electron trap of Ec-(0.51±0.02) eV is observed in the n-type samples, and the trap can be tentatively assigned to substitutional manganese. Furthermore, an electron trap of Ec-(0.50±0.02) eV is observed for n+p junction samples diffused with manganese in boron-doped p-type silicon. The trap is attributed to the manganese-boron complex, which is formed owing to the pairing reaction of interstitial manganese and substitutional boron. From the investigation of the pairing reaction, the diffusion coefficient DMn of interstitial manganese is determined in the temperature range 14-90°C. It can be represented by the expression DMn=2.4×10-3 exp(-0.72/kT)cm2 s -1.

    本文言語英語
    ページ(範囲)1440-1445
    ページ数6
    ジャーナルJournal of Applied Physics
    69
    3
    DOI
    出版ステータス出版済み - 12 1 1991

    All Science Journal Classification (ASJC) codes

    • Physics and Astronomy(all)

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