Deep states in silicon on sapphire by transient-current spectroscopy

T. Sadoh, A. Matsushita, Y. Q. Zhang, D. J. Bai, A. Baba, A. Kenjo, T. Tsurushima, H. Mori, H. Nakashima

研究成果: Contribution to journalArticle査読

3 被引用数 (Scopus)

抄録

It is demonstrated that deep states in silicon on sapphire (SOS) films can be evaluated by transient-current spectroscopy (TCS). In the TCS spectra, a broad peak extending over 100-200 K was observed for the 6000-Å-thick n-type SOS film. Assuming the value of capture cross section to be 10-15 cm2 and independent of temperature, the density distribution of deep states was estimated. The density distribution shows a peak of 1.2×1012 cm-2 eV-1 at EC-0.25 eV. Raman backscattering spectroscopy was also performed to evaluate the stress in the silicon film. It was concluded that the defects detected by TCS should be caused by the compressive stress of 6.2 × 108 Pa in the silicon film.

本文言語英語
ページ(範囲)5262-5264
ページ数3
ジャーナルJournal of Applied Physics
82
10
DOI
出版ステータス出版済み - 11 15 1997

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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