Dehydration after plasma oxidation of porous low-dielectric-constant spin-on-glass films

Eiichi Kondoh, Tanemasa Asano, Hiroki Arao, Akira Nakashima, Michio Komatsu

研究成果: ジャーナルへの寄稿記事

25 引用 (Scopus)

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In this paper, the dehydration behavior of hydrogen-methyl-siloxane-based porous spin-on-glass (SOG) films after oxygen plasma exposure is reported. The resultant loss of hydrophobia groups from the plasma exposure makes the films hygroscopic and thus the film dielectric constant can significantly increase. We employed a simple method consisting of spin-on coating of hexadimethyldisilazane (HMDS) with successive hotplate baking so as to dehydrate the films and decrease the film dielectric constant.

元の言語英語
ページ(範囲)3919-3923
ページ数5
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
39
発行部数7 A
出版物ステータス出版済み - 12 1 2000

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All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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