Delocalization corrections using a disordered structure for atom location by channelling-enhanced microanalysis in the Ni-Al system

Z. Horita, H. Kuninaka, T. Sano, M. Nemoto, J. C.H. Spence

    研究成果: Contribution to journalArticle査読

    11 被引用数 (Scopus)

    抄録

    A correction procedure for the delocalization effect when determining the site occupancy of an impurity element by atom location by channelling-enhanced microanalysis is proposed. The procedure utilizes a disordered structure with a composition similar to the ordered structure. Correction factors are derived by illuminating a sample with a disordered structure in the same orientation as for the ordered structure. The correction procedure is applied to a determination of the Ti occupancy in a Ni3Al intermetallic compound.

    本文言語英語
    ページ(範囲)425-432
    ページ数8
    ジャーナルPhilosophical Magazine A: Physics of Condensed Matter, Structure, Defects and Mechanical Properties
    67
    2
    DOI
    出版ステータス出版済み - 2 1993

    All Science Journal Classification (ASJC) codes

    • 電子材料、光学材料、および磁性材料
    • 材料科学(全般)
    • 凝縮系物理学
    • 物理学および天文学(その他)
    • 金属および合金

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