Dependence of the amplified spontaneous emission threshold in spirofluorene thin films on molecular orientation

Takeshi Komino, Hiroko Nomura, Masayuki Yahiro, Kuniaki Endo, Chihaya Adachi

研究成果: Contribution to journalArticle査読

28 被引用数 (Scopus)

抄録

The dependence of the amplified spontaneous emission threshold (E th) on molecular orientation in vacuum deposited thin films fabricated from diphenyldiamine- and carbazole-substituted spirofluorene derivatives was investigated. The molecular orientations were modified by changing the substrate temperature during deposition and were almost parallel to the substrate at around 300 K in all of the films. The orientation became random in the film containing diphenyldiamine compound at around 380 K, resulting in decreased optical anisotropy. However, for the carbazole compound, the molecular orientation scarcely changed from 300 to 380 K, while the root-mean-square roughness increased from 0.28 to 0.94 nm. Eth approximately doubled for both the films when the optical anisotropy decreased because of the randomization of molecular orientation or when the surface roughness increased.

本文言語英語
ページ(範囲)19890-19896
ページ数7
ジャーナルJournal of Physical Chemistry C
115
40
DOI
出版ステータス出版済み - 10 13 2011

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • エネルギー(全般)
  • 物理化学および理論化学
  • 表面、皮膜および薄膜

フィンガープリント

「Dependence of the amplified spontaneous emission threshold in spirofluorene thin films on molecular orientation」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル