Dependency of growth of Arabidopsis thaliana on intensity of D.C. electric field

Takamasa Okumura, Yuji Muramoto, Noriyuki Shimizu

研究成果: Contribution to journalConference article査読

抄録

We have studied the influence of electric field on plant growth. In previous papers, we reported that the D.C. electric field increases the seed germination rate, weight and length of daikon radish. We also obtain the similar effects for thale cress. It is reasonable to expect that there is an optimum intensity of D.C. electric field for plant growth improvement. As the first step to seek out the optimum intensity, the seeds of thale cress were cultivated under three circumstances; 0.0kV/m, 2.5kV/m, and 10.0kV/m of D.C. field. As a result, the growth is most increased by the 10.0kV/m; therefore, we estimated the optimum intensity to be higher than 2.5kV/m. In this paper, the detailed dependency of the growth of thale cress on the intensity of the D.C. electric field is studied.

本文言語英語
論文番号6378769
ページ(範囲)255-258
ページ数4
ジャーナルAnnual Report - Conference on Electrical Insulation and Dielectric Phenomena, CEIDP
DOI
出版ステータス出版済み - 2012
外部発表はい
イベント2012 IEEE Conference on Electrical Insulation and Dielectric Phenomena, CEIDP 2012 - Montreal, QC, カナダ
継続期間: 10 14 201210 17 2012

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 電子工学および電気工学

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