Deposition of a-Si: H films by ECR plasma CVD using large diameter multi-slot antennae

Yoko Ueda; Hideaki Teranishi; Masayoshi Tanaka; Shunjiro Shinohara; Yoshinobu Kawai

doi:10.1016/0257-8972(95)08253-0

Deposition of a-Si: H films by ECR plasma CVD using large diameter multi-slot antennae

Yoko Ueda, Hideaki Teranishi, Masayoshi Tanaka, Shunjiro Shinohara, Yoshinobu Kawai

研究成果: ジャーナルへの寄稿 › 学術誌 › 査読

8 被引用数 (Scopus)

抄録

A large diameter electron cyclotron resonance plasma was produced with a multi-slot antenna. The radial profile of the ion saturation current was examined as a function of input microwave power, gas pressure and magnetic mirror coil current to determine the experimental conditions necessary for a large diameter and uniform plasma at low pressure. Furthermore, the deposition of a-Si: H films was attempted onto 8 inch glass substrates using a gas mixture SiH₄-10% He.

本文言語	英語
ページ（範囲）	503-507
ページ数	5
ジャーナル	Surface and Coatings Technology
巻	74-75
号	PART 1
DOI	https://doi.org/10.1016/0257-8972(95)08253-0
出版ステータス	出版済み - 9月 1995

!!!All Science Journal Classification (ASJC) codes

化学 (全般)
凝縮系物理学
表面および界面
表面、皮膜および薄膜
材料化学

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10.1016/0257-8972(95)08253-0

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title = "Deposition of a-Si: H films by ECR plasma CVD using large diameter multi-slot antennae",

abstract = "A large diameter electron cyclotron resonance plasma was produced with a multi-slot antenna. The radial profile of the ion saturation current was examined as a function of input microwave power, gas pressure and magnetic mirror coil current to determine the experimental conditions necessary for a large diameter and uniform plasma at low pressure. Furthermore, the deposition of a-Si: H films was attempted onto 8 inch glass substrates using a gas mixture SiH4-10% He.",

author = "Yoko Ueda and Hideaki Teranishi and Masayoshi Tanaka and Shunjiro Shinohara and Yoshinobu Kawai",

year = "1995",

month = sep,

doi = "10.1016/0257-8972(95)08253-0",

language = "English",

volume = "74-75",

pages = "503--507",

journal = "Surface and Coatings Technology",

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TY - JOUR

T1 - Deposition of a-Si

T2 - H films by ECR plasma CVD using large diameter multi-slot antennae

AU - Ueda, Yoko

AU - Teranishi, Hideaki

AU - Tanaka, Masayoshi

AU - Shinohara, Shunjiro

AU - Kawai, Yoshinobu

PY - 1995/9

Y1 - 1995/9

N2 - A large diameter electron cyclotron resonance plasma was produced with a multi-slot antenna. The radial profile of the ion saturation current was examined as a function of input microwave power, gas pressure and magnetic mirror coil current to determine the experimental conditions necessary for a large diameter and uniform plasma at low pressure. Furthermore, the deposition of a-Si: H films was attempted onto 8 inch glass substrates using a gas mixture SiH4-10% He.

AB - A large diameter electron cyclotron resonance plasma was produced with a multi-slot antenna. The radial profile of the ion saturation current was examined as a function of input microwave power, gas pressure and magnetic mirror coil current to determine the experimental conditions necessary for a large diameter and uniform plasma at low pressure. Furthermore, the deposition of a-Si: H films was attempted onto 8 inch glass substrates using a gas mixture SiH4-10% He.

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U2 - 10.1016/0257-8972(95)08253-0

DO - 10.1016/0257-8972(95)08253-0

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SN - 0257-8972

VL - 74-75

SP - 503

EP - 507

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - PART 1

ER -

Deposition of a-Si: H films by ECR plasma CVD using large diameter multi-slot antennae

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!!!All Science Journal Classification (ASJC) codes

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