Deposition of cluster-free b-doped hydrogenated amorphous silicon films using sih 4+b10h1 4 multi-hollow discharge plasma chemical vapor deposition

Kazunori Koga, Kenta Nakahara, Yeon Won Kim, Takeaki Matsunaga, Daisuke Yamashita, Hidefumi Matsuzaki, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani

研究成果: Contribution to journalArticle

抜粋

We have deposited cluster-free B-doped hydrogenated amorphous silicon (a-Si:H) films using a SiH4+B10H14 multi-hollow discharge plasma chemical vapor deposition (CVD) method. We have studied the dependence of the deposition rate, band gap, and conductivity of the films on the gas flow rate ratio R =B 10H 14)=SiH 4. The deposition rate for SiH4+B10H14 plasmas is 2-3 times as high as that for pure SiH4 plasmas. Optical emission spectroscopy (OES) measurements indicate that SiH3 radical generation rate remains nearly constant regardless of R. These results suggest that BxHy radicals enhance the surface reaction probability and/or sticking probability of SiH 3, being the predominant deposition precursor. Cluster-free B-doped a-Si:H films have a wide band-gap energy of 1.8-2.0 eV and a conductivity as high as 5:0 × 10 -6 S/cm. These results demonstrate that cluster-free B-doped a-Si:H films deposited using SiH4+B10H14 multi-hollow discharge plasma CVD are promising as a p-layer of pin a-Si:H solar cells.

元の言語英語
記事番号01AD03
ジャーナルJapanese Journal of Applied Physics
51
発行部数1 PART 2
DOI
出版物ステータス出版済み - 1 1 2012

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

フィンガープリント Deposition of cluster-free b-doped hydrogenated amorphous silicon films using sih <sub>4</sub>+b10h1 <sub>4</sub> multi-hollow discharge plasma chemical vapor deposition' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

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