Deposition of cluster-free P-doped A-Si:H films using a multi-hollow discharge plasma CVD method

Kenta Nakahara, Yuki Kawashima, Muneharu Sato, Takeaki Matsunaga, Kousuke Yamamoto, William Makoto Nakamura, Daisuke Yamashita, Hidefumi Matsuzaki, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

研究成果: 著書/レポートタイプへの貢献会議での発言

1 引用 (Scopus)

抜粋

We have deposited cluster-free P-doped a-Si:H films using SiH 4+PH3 multi-hollow discharge plasma CVD method. We have measured dependence of a deposition rate and SiH emission intensity on a gas flow rate ratio R=[PH3]/[SiH4]. The increase of deposition rate with R is much larger than that of SiH emission intensity. These results suggest PHx radicals enhance surface reaction probability of SiH 3 radicals. The P concentration in the films can be controlled by the gas flow rate ratio for R<5%. We have succeeded in depositing P-doped a-Si:H films of a low stabilized defect density of 2.9×1015 cm -3. The conductivity of the films is lower than that of the conventional films. Other optoelectronic properties such as conductivity, its activation energy, and bandgap energy are value ranges of the conventional films.

元の言語英語
ホスト出版物のタイトルProgram - 35th IEEE Photovoltaic Specialists Conference, PVSC 2010
ページ3722-3725
ページ数4
DOI
出版物ステータス出版済み - 12 20 2010
イベント35th IEEE Photovoltaic Specialists Conference, PVSC 2010 - Honolulu, HI, 米国
継続期間: 6 20 20106 25 2010

出版物シリーズ

名前Conference Record of the IEEE Photovoltaic Specialists Conference
ISSN(印刷物)0160-8371

その他

その他35th IEEE Photovoltaic Specialists Conference, PVSC 2010
米国
Honolulu, HI
期間6/20/106/25/10

    フィンガープリント

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

これを引用

Nakahara, K., Kawashima, Y., Sato, M., Matsunaga, T., Yamamoto, K., Nakamura, W. M., ... Shiratani, M. (2010). Deposition of cluster-free P-doped A-Si:H films using a multi-hollow discharge plasma CVD method. : Program - 35th IEEE Photovoltaic Specialists Conference, PVSC 2010 (pp. 3722-3725). [5616514] (Conference Record of the IEEE Photovoltaic Specialists Conference). https://doi.org/10.1109/PVSC.2010.5616514