Deposition of crystalline Ge nanoparticle films by high-pressure RF magnetron sputtering method

D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

研究成果: Contribution to journalConference article査読

3 被引用数 (Scopus)

抄録

We report here deposition of crystalline Ge nanoparticle films using a radio frequency magnetron sputtering method in argon and hydrogen gas mixture under a high pressure condition. The size of Ge nanoparticles is deduced to be 6.3-6.4 nm from the peak frequency shift of Raman spectra. Raman and X-ray diffraction spectra show that the films are crystalline. The film crystallinity strongly depends on substrate temperature (Ts). Highly crystalline Ge nanoparticle films are successfully fabricated at Ts 180°C.

本文言語英語
論文番号012002
ジャーナルJournal of Physics: Conference Series
518
1
DOI
出版ステータス出版済み - 2014
イベント26th Symposium on Plasma Sciences for Materials, SPSM 2013 - Fukuoka, 日本
継続期間: 9 23 20139 24 2013

All Science Journal Classification (ASJC) codes

  • 物理学および天文学(全般)

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