TY - JOUR
T1 - Deposition rate and movement effect of paraffin-based EBID
AU - Kai, Satoshi
AU - Takahashi, Koji
AU - Norsyazwan, Hilmi
AU - Ikuta, Tatsuya
AU - Nishiyama, Takashi
AU - Nagayama, Kunihito
N1 - Funding Information:
I thank Professor Boubé Gado for his advice and support at Garumele, and am delighted to have had the opportunity to work together. I am grateful to the Ministère des Ensei-gnements Secondaire et Supérieur, de la Recherche et de la Technologie for allowing our research and to Inoussa Issa, Maifada Ganda, Malik Saako, and Ilya Amadou for their work and good cheer at Garumele. The ceramic analysis presented here was facilitated by Newcastle University who provided the space and facilities of the Wolfson laboratory, and by the Institut de Recherches en Sciences Humaines (Niamey) who issued a temporary export permit for the material. I am grateful to Graham Connah for unpublished data relating to the 1964 ceramics collections at Garumele, to Olivier Langlois for an advance copy of his Préhistoire Archéologie méditerrannéennes article, to Boubé Gado for relevant extracts from Maître’s unpublished report, and to two reviewers for comments on the first draft of this paper. Kevin Greene, Mark Jackson and Kat Manning offered useful discussion of pottery-related matters. Last but not least, I thank the British Institute in Eastern Africa and the British Academy for funding fieldwork and post-excavation costs respectively.
PY - 2008
Y1 - 2008
N2 - Electron-beam-induced deposition (EBID) is a simple and versatile technique to process materials for three-dimensional nanoscale structure. A variety of precursor molecules can be used to build a localized solid deposition by the exposure of electron beam onto a substrate. This paper reports on the nano carbon deposition by using solid n-tetracosane as a precursor because this paraffin-based EBID can be introduced in the existing scanning electron microscope (SEM) systems without difficulty. The paraffin is prepared on an aluminum film and operated by manipulator in SEM. The effects of accelerating voltage, beam current, magnification, distance from paraffin to exposure point, amount of paraffin, and working distance are measured and discussed. It is found that the electron-beam-induced etching and beam diameter sometimes work dominantly for deposition rate and the thickness of paraffin also affects the deposition distribution. The electron-beam bending, which is a critical issue causing degradation of nanofabrication, is treated carefully in order to understand the declination of carbon pillars. Obtained configurations of carbon pillars suggest that electrically charged paraffin due to the preliminary irradiation of electron beam causes Coulomb force and results in the movement effect of deposition.
AB - Electron-beam-induced deposition (EBID) is a simple and versatile technique to process materials for three-dimensional nanoscale structure. A variety of precursor molecules can be used to build a localized solid deposition by the exposure of electron beam onto a substrate. This paper reports on the nano carbon deposition by using solid n-tetracosane as a precursor because this paraffin-based EBID can be introduced in the existing scanning electron microscope (SEM) systems without difficulty. The paraffin is prepared on an aluminum film and operated by manipulator in SEM. The effects of accelerating voltage, beam current, magnification, distance from paraffin to exposure point, amount of paraffin, and working distance are measured and discussed. It is found that the electron-beam-induced etching and beam diameter sometimes work dominantly for deposition rate and the thickness of paraffin also affects the deposition distribution. The electron-beam bending, which is a critical issue causing degradation of nanofabrication, is treated carefully in order to understand the declination of carbon pillars. Obtained configurations of carbon pillars suggest that electrically charged paraffin due to the preliminary irradiation of electron beam causes Coulomb force and results in the movement effect of deposition.
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U2 - 10.1541/ieejsmas.128.161
DO - 10.1541/ieejsmas.128.161
M3 - Article
AN - SCOPUS:73849127431
VL - 128
SP - 161-166+7
JO - IEEJ Transactions on Sensors and Micromachines
JF - IEEJ Transactions on Sensors and Micromachines
SN - 1341-8939
IS - 4
ER -