Deposits removal and hydrogen release on co-deposited films exposed to O-ICR and O-GDC plasmas in HT-7

J. S. Hu, J. G. Li, N. Ashikawa, K. Tokunaga, N. Noda, N. Yoshida

研究成果: Contribution to journalArticle査読

4 被引用数 (Scopus)

抄録

A few new results of oxidation wall conditionings for deposits removal and hydrogen release were directly obtained on exposure of co-deposited films to O-ICR or O-GDC plasmas in HT-7. After the O-ICR or O-GDC treatments, the deposits were partially removed and deuterium retention was reduced. D 2 release from samples was reduced by a factor of 2-3, and the ratio of D/C decreased whereas that of O/C increased. The removal rates of C in various oxidation wall conditionings were about 1018-1019C m-2 min-1, which approached the estimated carbon deposited rates, of about 5.2 × 1018C m-2 min -1, on the tested samples. The He/O-ICR was more effective on the deposits removal and hydrogen (deuterium) release than O-GDC. And O-ICR was more effective on the surface facing main plasma than on that facing SOL plasma, whereas O-GDC possibly has uniform effectivity on both tested surfaces.

本文言語英語
論文番号006
ページ(範囲)421-434
ページ数14
ジャーナルPlasma Physics and Controlled Fusion
49
4
DOI
出版ステータス出版済み - 4 1 2007

All Science Journal Classification (ASJC) codes

  • 原子力エネルギーおよび原子力工学
  • 凝縮系物理学

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