Deposits removal and hydrogen release on co-deposited films exposed to O-ICR and O-GDC plasmas in HT-7
J. S. Hu, J. G. Li, N. Ashikawa, K. Tokunaga, N. Noda, N. Yoshida
研究成果: ジャーナルへの寄稿 › 学術誌 › 査読
4
被引用数
(Scopus)