Depth-resolved local conformation and thermal relaxation of polystyrene near substrate interface

Hung Kim Nguyen, Manabu Inutsuka, Daisuke Kawaguchi, Keiji Tanaka

研究成果: ジャーナルへの寄稿記事

11 引用 (Scopus)

抄録

By means of sum-frequency generation spectroscopy, we report a depth-resolved measurement of the local conformation and chain relaxation of polystyrene (hPS) located at different distances from the quartz interface. To control the distance from the quartz interface, deuterated polystyrene (dPS) layers with thicknesses of 3.4, 7.5, and 20 nm were coated on the quartz substrates. The hPS chains in direct contact with the substrate surface predominantly orient their phenyl rings in a direction normal to the substrate. This conformation was found to be barely relaxed when the film was annealed for 24 h at 423 K, higher than the bulk glass transition temperature. In contrast, for the hPS chains supported on the dPS layer, the orientation of phenyl rings of hPS became weaker with the annealing and this trend was more significant with increasing distance from the quartz substrate. In particular, the orientation of phenyl rings of hPS after annealing vanished at a distance of 20 nm. These results might provide an important evidence of the difference in the relaxation dynamics of the PS chains located at different distances from the quartz interface.

元の言語英語
記事番号203313
ジャーナルJournal of Chemical Physics
146
発行部数20
DOI
出版物ステータス出版済み - 5 28 2017

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Quartz
Polystyrenes
Conformations
polystyrene
quartz
Substrates
rings
Annealing
depth measurement
annealing
glass transition temperature
Hot Temperature
Spectroscopy
trends
spectroscopy

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry

これを引用

Depth-resolved local conformation and thermal relaxation of polystyrene near substrate interface. / Nguyen, Hung Kim; Inutsuka, Manabu; Kawaguchi, Daisuke; Tanaka, Keiji.

:: Journal of Chemical Physics, 巻 146, 番号 20, 203313, 28.05.2017.

研究成果: ジャーナルへの寄稿記事

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