Design of two-stage soft-X-ray nano-focusing system with a ring-focusing mirror and quasi-Wolter mirror

Yoko Takeo, Hiroto Motoyama, Takenori Shimamura, Takashi Kimura, Takehiro Kume, Yusuke Matsuzawa, Takahiro Saito, Yoichi Imamura, Hiroaki Miyashita, Kentarou Hiraguri, Hirokazu Hashizume, Yasunori Senba, Hikaru Kishimoto, Haruhiko Ohashi, Hidekazu Mimura

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

1 被引用数 (Scopus)

抄録

Focusing x-rays is a key technology for x-ray microscopic techniques. In a soft-x-ray region, focusing systems with achromaticity and a high numerical aperture have long been desired as a substitute for Fresnel zone plates. Ellipsoidal mirrors are promising focusing optics for such systems. However, two technical problems have to be overcome to allow practical application of these mirrors: their low efficiency due to their hollow shapes and strict requirements for their alignment. A novel focusing system using two reflective mirrors was proposed for this purpose. The downstream mirror is a quasi-Wolter mirror with a hollow shape similar to an ellipsoidal mirror and has a high numerical aperture of more than 0.1. The tolerance of the setting angle error of the quasi-Wolter mirror is significantly large compared to that of the ellipsoidal mirror because a quasi-Wolter mirror reflects the incident rays twice. The upstream mirror is a ring-focusing mirror, which produces an x-ray beam with a ring-shaped intensity profile, ensuring the entire beam reflects onto the quasi-Wolter mirror and reaches the focus of the system. The proposed system is ideal for soft-x-ray focusing. The design procedure and formulas are described in the present study. A prototype of the system is designed for BL25SU-A of SPring- 8. The ideal focusing spot size is estimated by numerical simulation to be 10 nm at 300 eV. The influence of alignment errors of the two mirrors is also simulated and summarized.

本文言語英語
ホスト出版物のタイトルAdvances in Metrology for X-Ray and EUV Optics IX
編集者Lahsen Assoufid, Haruhiko Ohashi, Anand Asundi
出版社SPIE
ISBN(電子版)9781510637900
DOI
出版ステータス出版済み - 2020
外部発表はい
イベントAdvances in Metrology for X-Ray and EUV Optics IX 2020 - Virtual, Online, 米国
継続期間: 8 24 20209 4 2020

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
11492
ISSN(印刷版)0277-786X
ISSN(電子版)1996-756X

会議

会議Advances in Metrology for X-Ray and EUV Optics IX 2020
国/地域米国
CityVirtual, Online
Period8/24/209/4/20

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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