Design of ultrashort Kirkpatrick-Baez mirror for soft x-ray nanofocusing

Takenori Shimamura, Yoko Takeo, Takashi Kimura, Hirokazu Hashizume, Yasunori Senba, Hikaru Kishimoto, Hidekazu Mimura

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

抄録

X-ray focusing optics are essential for acquiring high-quality X-ray microscopy images. Fresnel zone plates (FZPs) are conventionally used to focus soft X-rays via diffraction. The use of Kirkpatrick-Baez (KB) mirrors for nanofocusing in the soft X-ray region is limited because a KB mirror is a reflective X-ray focusing optic that has a pair of perpendicular mirrors in a grazing-incidence configuration, which lowers the numerical aperture due to the long focal length. KB mirrors with a short focal length have been proposed for hard X-ray focusing. This paper presents the design of an ultrashort KB mirror for soft X-ray focusing that has an extremely short focal length, which is achieved by reducing its mirror length. Moreover, a large grazing angle is employed to utilize total-reflection-based focusing. An ultrashort KB mirror is proposed for pilot studies at beamline BL25SU-A, SPring-8, Japan. A ray-tracing simulator is used to determine the misalignment tolerance in terms of roll and yaw for each mirror in the KB geometry. Based on the results, a mirror manipulator and other equipment are designed to precisely position the mirrors. Although this strategy, commonly used for FZPs, leads to a short working distance and a small beam acceptance, we believe that it can be applied to ultrashort KB mirrors for X-ray microscopy applications with achromaticity and strong demagnification.

本文言語英語
ホスト出版物のタイトルAdvances in Metrology for X-Ray and EUV Optics IX
編集者Lahsen Assoufid, Haruhiko Ohashi, Anand Asundi
出版社SPIE
ISBN(電子版)9781510637900
DOI
出版ステータス出版済み - 2020
外部発表はい
イベントAdvances in Metrology for X-Ray and EUV Optics IX 2020 - Virtual, Online, 米国
継続期間: 8 24 20209 4 2020

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
11492
ISSN(印刷版)0277-786X
ISSN(電子版)1996-756X

会議

会議Advances in Metrology for X-Ray and EUV Optics IX 2020
Country米国
CityVirtual, Online
Period8/24/209/4/20

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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