TY - JOUR
T1 - Development of a 2 kHz F2 laser for 157 nm lithography
AU - Nagai, Shinji
AU - Takehisa, Kiwamu
AU - Enami, Tatsuo
AU - Nishisaka, Toshihiro
AU - Fujimoto, Junichi
AU - Wakabayashi, Osamu
AU - Mizoguchi, Hakaru
AU - Takahashi, Akihiko
PY - 1999
Y1 - 1999
N2 - We have developed a 2kHz repetition rate discharge-pumped molecular fluorine laser oscillating at 157 nm. It has achieved an average power of 22 W at the repetition rate of 2kHz with a newly developed solid-state pulse power module which has a maximum input energy of 6 J/pulse. The multi-kilohertz F: laser is a key device for 157 nm lithography aimed at the design rule of below 0.10 microns.
AB - We have developed a 2kHz repetition rate discharge-pumped molecular fluorine laser oscillating at 157 nm. It has achieved an average power of 22 W at the repetition rate of 2kHz with a newly developed solid-state pulse power module which has a maximum input energy of 6 J/pulse. The multi-kilohertz F: laser is a key device for 157 nm lithography aimed at the design rule of below 0.10 microns.
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U2 - 10.1143/jjap.38.7013
DO - 10.1143/jjap.38.7013
M3 - Article
AN - SCOPUS:0033316165
SN - 0021-4922
VL - 38
SP - 7013
EP - 7016
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 12 B
ER -